Youtor
How To Spin Coat Resist
>> YOUR LINK HERE: ___ http://youtube.com/watch?v=WAFE6pZBT9c
This video demonstrates how spin coating of resist can be performed at NTNU NanoLab. • NTNU NanoLab Users can find more information at: http://forum.nano.ntnu.no/t/how-to-sp... • *Dispensing resist* • The volume of resist needed to coat depends on the viscosity and final thickness of the resist. Typically no more than 0.5 mL of resist is needed to coat a 2-inch wafer. • *Cleaning instructions* • Photoresist spinner: Ethanol • EBL spinner: Ethanol for most resist, acetone for CSAR62 • SU-8 and mr-DWL spinner: Acetone
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