Tantalum Sputtering Target AEM Deposition

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Tantalum Sputtering Target https://www.aemdeposition.com/pure-me... • Details as follows: • Tantalum (Ta) Sputtering Target • Purity: 99.95% • Size: 450 mm x 150 mm x 8 mm • Tolerance: ± 0.1 on all the dimensions • Applications • Optical films • Electronic • Semiconductor • Diffusion barrier layer • Related products: • Pure metal sputtering targets https://www.aemdeposition.com/pure-me... • Alloy sputtering targets https://www.aemdeposition.com/alloy-t... • Oxide sputtering targets https://www.aemdeposition.com/oxide-t... • Sulfide sputtering targets https://www.aemdeposition.com/sulfide... • Selenide sputtering targets https://www.aemdeposition.com/selenid... • Boride sputtering targets https://www.aemdeposition.com/boride-... • Carbide sputtering targets https://www.aemdeposition.com/carbide... • Silicide sputtering targets https://www.aemdeposition.com/silicid... • Telluride sputtering targets https://www.aemdeposition.com/telluri... • Nitride sputtering targets https://www.aemdeposition.com/nitride... • Fluoride sputtering targets https://www.aemdeposition.com/fluorid... • Follow us: • YouTube: / @aemdepositionaemmetal3523 • Twitter: / aemdeposition • Linkedin: / admin

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